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  • Actual load capacity of magnetically controlled sputtering target

    The actual load carrying capacity of the magnetically controlled target is not only related to the sputtering process and the quality requirements of the film, but also closely related to the cooling conditions and the cooling conditions of the target.

    2017-07-14
  • Sputtering targets for magnetic applications

    The magnetic material sputtering targets are widely used as the key elements for producing magnetic recording media.Baoji Oukai sputtering target's magnetic material sputtering targets enjoy a high reputation thanks to their well-controlled uniform bulk magnetic properties.

    2017-07-07
  • The production flow of several sputtering targets

    As we all know, high purity sputtering target has been widely used in various fields, but many users do not understand the process of target in the process of production. Today,Baoji OuKai will introduce three kinds of high purity target production process.

    2017-06-30
  • The purpose of target in vacuum plating

    The target material has many functions, and the market development space is large, it has good use in many fields.The new type of splash - plated equipment USES powerful magnets to accelerate the electrons into a spiral motion to ....

    2017-06-30
  • Main performance requirements of sputtering target

    The purity is one of the main performance indexes of the target material, because the purity of the target material has a great influence on the performance of the film.

    2017-06-28
 
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