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  • Application of high purity sputtering target in mobile chip

    Where does the chip in the phone come from? This cake like metal material, called high purity sputtering target, is the key material in the manufacture of semiconductor chips.

  • What are the classification of the sputtering target?

    According to the application, it mainly includes semiconductor field application target, target material for recording medium, target material for display film, optical target material, superconducting target, etc.

  • NiCrSi high resistivity sputtering target

    The main target for the preparation of metal film resistor and high resistance metal oxide film resistors, integrated circuit wiring and sensors, used in computer, communication equipment, electronic switches,

  • Advantages of magnetron sputtering technology

    Magnetron sputtering has been developed rapidly and widely applied since its inception. It effectively impacts the status of other coating methods and is mainly determined by its advantages.

  • Why are high-end sputtering target developing in great size

    The development trend of target technology is closely related to the development trend of thin film technology in downstream application industry.

  • Sputtering target market to exceed $540 million

    Sputtering targets are available in a range of precious and non-precious materials, including pure elements or compounds and alloys, and might include precious metals like gold, palladium, and platinum. 

  • How to improve the utilization ratio of molybdenum sputtering target

    In the electronics industry, molybdenum sputtering targets are mainly used in flat panel displays,electrodes and wiring materials for thin film solar cells, and barrier materials for semiconductors.

  • The application of SVC silicon alloy to sputtering target

    Target mainly for SVC series silicon alloy tool coating super-hard membrane of sputtering target, clocks and watches recently, mobile phones have the demand like black against the fingerprints of hard film, stainless steel casing and hard, imitation gold superhard film, etc. 

  • The preparation of aluminum alloy sputtering target

    The disadvantage of the casting method for sputtering target of aluminum alloy is that the target is prone to segregate and influence the quality of the sputtering film.

  • What are sputtering target types

    With the rapid development of electronic information industry, the application of thin film science is becoming more and more extensive.Sputtering is one of the main techniques for producing thin film materials.

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