Semiconductor Correlative targets / Thin film of electrode and wire layout : aluminium target, copper target,gold target,silver target, palladium target, platinum target,aluminum silicon target,aluminium silicon copper alloy target and so on.
Recently,China promulgated related policy about sputtering target.Next, Baoji Oukai Sputtering Target will share the content with you.
In recent years, liquid crystal display gradually replace the cathode ray tube display to become the world's leading display technology,has been widely used in the flat display market.
Tungsten target implies an X-Ray tube where high energy electrons are directed in a vacuum to strike a tungsten target.
The grain sizes influence the rate of sputtering target material. So if this rate increases due to grain size and the the plasma parameters the property of deposited film also changes.
Baoji Okai sputtering target has earned high trust from our customers by providing AZO targets with a variety of features.
Titanium sputtering target is a material that is used to create thin films in a technique known as sputter deposition, or thin film deposition.
Magnetron sputtering is a new way of physical vapor coating, evaporation coating methods compared to earlier points, its many advantages are obvious.
Baoji Oukai sputtering target mainly presents Molybdenum sputtering target by its shape,process and application.
OUKAI produces high-quality sputtering targets made out of all kinds of materials, optionally bonded to specially designed backing plates. If you need more detailed product information,please contact us at any time!