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magnetron sputtering

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  • The common PVD methods : magnetron sputtering& evaporation

    The most common types of physical vapor deposition (PVD) are magnetron sputtering and evaporation, which could be either thermal or electron beam (e-beam). China sputtering target manufacturer----Baoji Oukai tells you how to choose PVD methods.

  • What is sputtering?

    Sputtering is a technique whereby a solid target material is bombarded with energetic particles to eject atoms from it and then deposit a thin film on the substrate. Sputtering target and evaporation materials (ST&EM) play a vital role in industries like electronics, energy, optics,etc..

  • Magnetron sputtering process

    There are a number of ways to enhance this magnetron sputtering process.One common way to do this is to use what is known as a magnetron sputtering system.

  • The advantages of vacuum magnetron sputtering coating

    The vacuum magnetron sputtering coating can effectively reduce the working pressure of the target chamber and the working voltage of the target, increase the sputtering and deposition rate, reduce the substrate temperature and reduce the damage of the plasma to the film layer.

  • Sputtering Targets for Magnetic Applications

    The magnetic material sputtering targets of Baoji Oukai Sputtering Targets Technology Co.,Ltd. are widely used as the key elements for producing magnetic recording media.  

  • The knowledge about magnetron sputtering target

    Magnetron sputtering is a new way of physical vapor coating, evaporation coating methods compared to earlier points, its many advantages are obvious.

  • The principle of magnetron sputtering target

    Magnetron sputtering principle: in sputtering target (cathode) with an orthogonal magnetic field and electric field and anode, sputtering target in high vacuum chamber filled with inert gases needed (usually Ar), the permanent magnet forms 250 to 350 Gauss magnetic field on the target surface, with high pressure electric field.

  • What is magnetron sputtering ?

    Magnetron sputtering is a physical vapor deposition coating technique used to deposit thin films of materials, such as metals, plastics and ceramics, onto other surfaces or substrates.

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