Magnetron sputtering deposition is a new kind of physical vapor phase deposition method, which use the electron emission electron gun system and focus on the plating material to make the atoms that were sputtered on the target follow the principle of momentum transfer move from the target surfa
People can't live without sputtering targets in modern life.Phones, credit cards, cameras, second-generation id cards...They all have a chip.The ultrafine metal conductor in chip, which is nearly 10,000 meters in length, is made by sputtering target.
Nowadays，sputtering targets are widely applied in semiconductor,architectural window glass for energy conservation, decorative with familiar gold-coloured hard coating. Baoji Oukai summarizes the typical material of sputtering targets in various applications.
Baoji Okai's W-Ti sputtering targets’ microstructure and phase structure are customized for low particulation, high uniformity,conductive films.
The grain sizes influence the rate of sputtering target material. So if this rate increases due to grain size and the the plasma parameters the property of deposited film also changes.
Wires and thin films of precious metals and their alloy sputtering targets made by refining, melting, forging, rolling, processing, or powder metallurgy processes, semiconductor devices, recording media, display devices, etc..
Why someone would want to use rotary sputtering targets instead of planar sputtering targets? There are 5 reasons.
The magnetic material sputtering targets of Baoji Oukai Sputtering Targets Technology Co.,Ltd. are widely used as the key elements for producing magnetic recording media.
The target material has many functions, and the market development is very large. It has a very good use in many fields. Almost all of the sputtering devices use powerful magnets to spiral the electrons to accelerate argon ionization around the target.