As the market interest in vacuum coating by magnetron sputtering grows, magnetron sputtering target manufacturing is consequently expanding. Today we talk about main parameters of rotatable sputter targets.
The invention relates to a method for preparing a magnetron tubular niobium sputtering target:In the first step, a niobium ingot with a diameter of 265mm to 275mm is forged at a temperature of 1000 DEG C .
The magnetic material sputtering targets of Baoji Oukai Sputtering Targets Technology Co.,Ltd. are widely used as the key elements for producing magnetic recording media.
Magnetron sputtering is a new way of physical vapor coating, evaporation coating methods compared to earlier points, its many advantages are obvious.
Magnetron sputtering principle: in sputtering target (cathode) with an orthogonal magnetic field and electric field and anode, sputtering target in high vacuum chamber filled with inert gases needed (usually Ar), the permanent magnet forms 250 to 350 Gauss magnetic field on the target surface, with high pressure electric field.
With the increasing development of sputtering target, especially magnetron sputtering technology,any material can be prepared by ion bombardment of the target film.
Magnetron sputtering is a physical vapor deposition coating technique used to deposit thin films of materials, such as metals, plastics and ceramics, onto other surfaces or substrates.