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high purity coating sputtering target

  • BAOJI OUKAI
  • Ti Zr Cr Ni Cu TiAl CrAl NiCr etc.
  • <100μm
  • 2N5-4N
  • Decoration and Tool coating, Electronic industry, Flat panel display industry, Low-E glass coating etc.
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Item: High purity coating sputtering target

Material: Ti  Zr  Cr   Ni   Cu  TiAl  CrAl   NiCr etc.

Purity: 2N5-4N

Grain Size:<100μm

Technics: Powder metallurgy

Application: Decoration and Tool coating, Electronic industry, Flat panel display industry, Low-E glass coating etc.

 

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