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| Quantity: | |
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Item: High purity coating sputtering target
Material: Ti Zr Cr Ni Cu TiAl CrAl NiCr etc.
Purity: 2N5-4N
Grain Size:<100μm
Technics: Powder metallurgy
Application: Decoration and Tool coating, Electronic industry, Flat panel display industry, Low-E glass coating etc.
Item: High purity coating sputtering target
Material: Ti Zr Cr Ni Cu TiAl CrAl NiCr etc.
Purity: 2N5-4N
Grain Size:<100μm
Technics: Powder metallurgy
Application: Decoration and Tool coating, Electronic industry, Flat panel display industry, Low-E glass coating etc.
