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Zirconium sputtering target

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Zirconium sputtering target

  Baoji Oukai specializes in producing high purity Zirconium Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

  Product Name:Zirconium 702 sputtering target

  Available Purity :99.2% ~99.99%

  Chemical Composition:Zirconium

  Shape:planar,rotatable,round,according to your request


  1. For producing electric light source parts and electric vacuum components.

  2. For producing heating elements and refractory parts in high temperature furnaces.

  3. For producing medical laboratory equipment.

  4. Used as electrodes in the field of rare earth industry.

  5. Used in the manufacture of weapons.

  6. Used to make decorations and etc.

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