What is titanium sputtering target?

　　Titanium sputtering target is a material that is used to create thin films in a technique known as sputter deposition, or thin film deposition. 

       During this process the titanium, which begins as a solid, is broken up by gaseous ions into tiny particles that form a spray and coat another material, which is known as the substrate. Sputter deposition is commonly involved in the creation of semiconductors and computer chips.