What is titanium sputtering target?

　　Titanium sputtering target is a material that is used to create thin films in a technique known as sputter deposition, or thin film deposition. During this process the titanium, which begins as a solid, is broken up by gaseous ions into tiny particles that form a spray and coat another material, which is known as the substrate. Sputter deposition is commonly involved in the creation of semiconductors and computer chips.

　　Titanium sputtering target is widely used in aerospace structural materials, such as aircraft, rockets, missiles and spacecraft, ship manufacture, chemical industry, conventional weapons, manufacturing, metallurgical industry, health care, ultra-high vacauum and other fields.