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Vacuum melting technology 99.999% Cu target Copper sputtering target

  • OUKAI
  • Cu
  • <100μm
  • 99.999%
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Item:Vacuum melting technology 99.999% Cu target Copper sputtering target

Material: Cu

Purity: 99.99% 99.999% 99.9999%

Grain Size: <100μm

Application:Flat Panel Display, Semiconductors, Micro-Electronics etc.


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