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Item: Top quality Nickel Ni sputtering target for PVD coating
Material: Ni
Purity: 99.8%
Grain size: ＜100μm
Technics: Vacuum Melting, Patented thermo-mechanical process and machine work
Application: Widely used in coating processing industries
A: Solar photovoltaic application.
B: Electronic and semiconductor application.
C: Decoration and coating application. etc.
D:Magnetic data storage application
Item: Top quality Nickel Ni sputtering target for PVD coating
Material: Ni
Purity: 99.8%
Grain size: ＜100μm
Technics: Vacuum Melting, Patented thermo-mechanical process and machine work
Application: Widely used in coating processing industries
A: Solar photovoltaic application.
B: Electronic and semiconductor application.
C: Decoration and coating application. etc.
D:Magnetic data storage application
