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Product Name：Titanium copper sputtering target
Purity：99.95%
Melting point：1907℃
Chemical Composition：Ti，Cu
Shape：Flat target, according to your request
Technics：Hot Isostatic Pressing(HIP),Patented Thermo-mechanical process
Application：
Electroplating, electrolysis, wet metallurgy,petroleum chemical industry,
Energy engineering, ocean engineering,Surface treatment, electrode manufacturing
Product Name：Titanium copper sputtering target
Purity：99.95%
Melting point：1907℃
Chemical Composition：Ti，Cu
Shape：Flat target, according to your request
Technics：Hot Isostatic Pressing(HIP),Patented Thermo-mechanical process
Application：
Electroplating, electrolysis, wet metallurgy,petroleum chemical industry,
Energy engineering, ocean engineering,Surface treatment, electrode manufacturing
