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Product Name：Thin film materials 99.95%(3N5) Molybdenum sputtering target Mo target
Purity：3N5
Material：Molybdenum
Grain size：＜100μm
Technics：Hot Iisostatic Pressing, Powder Metallurgy, Patented thermo-mechanical process
Application：Widely used in coating processing industries
A: Solar Photovoltaic Application.
B: Electronic and Semiconductor Application.
C: Decoration and Coating Application. etc.
Product Name：Thin film materials 99.95%(3N5) Molybdenum sputtering target Mo target
Purity：3N5
Material：Molybdenum
Grain size：＜100μm
Technics：Hot Iisostatic Pressing, Powder Metallurgy, Patented thermo-mechanical process
Application：Widely used in coating processing industries
A: Solar Photovoltaic Application.
B: Electronic and Semiconductor Application.
C: Decoration and Coating Application. etc.
