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Thin film materials 99.95%(3N5) Molybdenum sputtering target Mo target

  • BAOJI OUKAI
  • Molybdenum
  • <100μm
  • 3N5
  • Widely used in coating processing industries
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Product Name:Thin film materials 99.95%(3N5) Molybdenum sputtering target   Mo target

Purity:3N5

Material:Molybdenum

Grain size:<100μm

Technics:Hot Iisostatic Pressing, Powder Metallurgy, Patented thermo-mechanical process

Application:Widely used in coating processing industries

A: Solar Photovoltaic Application.

B: Electronic and Semiconductor Application.

C: Decoration and Coating Application. etc.


 
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