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Thin Film Coating Material-----Tungsten Target/Tungsten Sputtering Target/W Target
Material: tungsten
Grain size: ＜100μm
Purity: 99.98%
Technics: Powder metallurgy
Application: Tungsten target, belongs to sputtering targets.Its diameter is within 300mm,length is below 500mm,width is below 300mm and the thickness is above 0.3mm. Widely used in vacuum coating industry, target materials raw materials, aerospace industry, Marine automobile industry, electrical industry, instruments industry, etc.
An important way to make thin-film material is sputtering—a new way of physical vapor deposition (PVD). The thin-film made by target is characterized by high density and good adhesiveness. As the magnetron sputtering techniques being widely applied, the high pure metal and alloy targets are in great need. Being with high melting point, elasticity, low coefficient of thermal expansion, resistivity and fine heat stability, pure tungsten and tungsten alloy targets are widely used in semiconductor integrated circuit, two-dimensional display, solar photovoltaic, X ray tube and surface engineering.
It can work with both older sputtering devises as well as the latest process equipments, such as large area coating for solar energy or fuel cells and flip-chip applications.
Thin Film Coating Material-----Tungsten Target/Tungsten Sputtering Target/W Target
Material: tungsten
Grain size: ＜100μm
Purity: 99.98%
Technics: Powder metallurgy
Application: Tungsten target, belongs to sputtering targets.Its diameter is within 300mm,length is below 500mm,width is below 300mm and the thickness is above 0.3mm. Widely used in vacuum coating industry, target materials raw materials, aerospace industry, Marine automobile industry, electrical industry, instruments industry, etc.
An important way to make thin-film material is sputtering—a new way of physical vapor deposition (PVD). The thin-film made by target is characterized by high density and good adhesiveness. As the magnetron sputtering techniques being widely applied, the high pure metal and alloy targets are in great need. Being with high melting point, elasticity, low coefficient of thermal expansion, resistivity and fine heat stability, pure tungsten and tungsten alloy targets are widely used in semiconductor integrated circuit, two-dimensional display, solar photovoltaic, X ray tube and surface engineering.
It can work with both older sputtering devises as well as the latest process equipments, such as large area coating for solar energy or fuel cells and flip-chip applications.
