Views: 6 Author: Site Editor Publish Time: 2017-08-11 Origin: Site
The invention relates to a method for preparing a magnetron tubular niobium sputtering target:
In the first step, a niobium ingot with a diameter of 265mm to 275mm is forged at a temperature of 1000 DEG C to 1200 DEG C under the condition that the niobium ingot with a diameter of 220mm to 260mm is heated;
Step two, a cylindrical niobium billet is drilled in the cylindrical niobium blank center at a diameter of 49mm to 51mm in step 1, and then evenly coated with an oxidation resistant coating on the inner and outer wall surfaces of the tubular niobium billet;
Step three, tubular niobium billets will process 2 coated with coatings in the extrusion temperature is 900 to 1050 DEG C, the extrusion ratio is 4.1 ~ 7.6 under the condition of extrusion diameter is 140mm ~ 170mm, 100mm ~ 135mm diameter of niobium billet; the extrusion process control of extrusion velocity is 150mm/s ~ 180mm/s;
Step four, sandblasting, pickling and mechanical processing of the niobium tube billets in step 3 are carried out, and a tubular niobium target semi-finished product with an outer diameter of 135mm to 165mm and an inner diameter of 105mm to 140mm is obtained;
Step five, to step 4 of the tubular niobium target semi-finished vacuum heat treatment by magnetron sputtering with tubular niobium target; processing temperature of the vacuum heat treatment is 930 to 1080 DEG C, the holding time is 100min ~ 300min.