The knowledge about magnetron sputtering target

　　Magnetron sputtering is a new way of physical vapor coating, evaporation coating methods compared to earlier points, its many advantages are obvious. As has been the development of a more mature technology, magnetron sputtering has been used in many fields.

　　Magnetron sputtering target contains metal sputtering targets, alloy sputtering targets, ceramic sputtering targets, ceramic sputtering target boride, carbide, ceramic sputtering targets, ceramic sputtering target fluoride nitride ceramic sputtering target, oxide ceramic target, selenide ceramic sputtering target, silicide ceramic sputtering targets, ceramic sputtering target sulfides, tellurides ceramic sputtering targets, other ceramic target, chromium oxide doped silicon ceramic target (Cr-SiO), indium phosphide target (InP), arsenic lead target (PbAs), indium arsenide target (InAs).