The features of Tungsten-Titanium (W-Ti) sputtering targets

　　Baoji Okai sputtering target's W-Ti sputtering targets’ microstructure and phase structure are customizedfor low particulation, high uniformity,conductive films.

　　1.High density and low variability

　　>98% bulk density

　　Less than <+/-0.5% density variation across targets

　　2.Low defect content including low porosity, and very low exogenous and indigenous inclusions

　　3.Minimal lamellar ß (Ti-W) phase

　　4.Engineered target surfaces to suppress secondary flaking due to back deposition

　　5.High Purity with low oxygen and low alkali content. Purity levels available as high as 99.999%

　　6.Large lot sizes allowing a larger number of targets from a single production lot

　　7.Consistent grain sizes of less than 20μm both over the area of the target and through the thickness