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The features of Tungsten-Titanium (W-Ti) sputtering targets

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 The features of Tungsten-Titanium (W-Ti) sputtering targets

  Baoji Okai sputtering target's W-Ti sputtering targets’ microstructure and phase structure are customizedfor low particulation, high uniformity,conductive films.

  1.High density and low variability

  >98% bulk density

  Less than <+/-0.5% density variation across targets

  2.Low defect content including low porosity, and very low exogenous and indigenous inclusions

  3.Minimal lamellar ß (Ti-W) phase

  4.Engineered target surfaces to suppress secondary flaking due to back deposition

  5.High Purity with low oxygen and low alkali content. Purity levels available as high as 99.999%

  6.Large lot sizes allowing a larger number of targets from a single production lot

  7.Consistent grain sizes of less than 20μm both over the area of the target and through the thickness


 
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