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The characteristics of sputtering target

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The characteristics of sputtering target

   Materials for sputtering targets have to fulfill specific requirements: The most important characteristics include:

  • purity

  • chemical homogeneity in case of alloys (stoichiometry)

  • homogeneity of the structure (grain size, texture, precipitates, crystallinity)

  • target density

  • no oxide or other impurity inclusions (metals and alloys)

  • no pores and voids

  Coating Materials 

  • good electrical conductivity (ceramics and semiconductors)

  • no surface contamination

  • dimension, target surface roughness

  • mechanical stability of the compound target


 
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