Views: 1 Author: Site Editor Publish Time: 2017-06-23 Origin: Site
Materials for sputtering targets have to fulfill specific requirements: The most important characteristics include:
• purity
• chemical homogeneity in case of alloys (stoichiometry)
• homogeneity of the structure (grain size, texture, precipitates, crystallinity)
• target density
• no oxide or other impurity inclusions (metals and alloys)
• no pores and voids
Coating Materials
• good electrical conductivity (ceramics and semiconductors)
• no surface contamination
• dimension, target surface roughness
• mechanical stability of the compound target