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Sputtering target for Low-E glass coating

Views:5     Author:Site Editor     Publish Time: 2017-07-03      Origin:Site

 Sputtering target for Low-E glass coating

  Over the years, the demands on glass have changed, from simple protection to design and comfort and then to high-performance functional elements with sophisticated optoelectronic coatings, dedicated to energy efficiency, optical appearance and a comfortable life style. As a main sputter target manufacturer for thin-film coatings, Baoji Oukai produces sputtering targets for a broad range of applications.

  Production methods used in manufacturing sputtering target are casting, powder metallurgy,Hot Plasma spray(HPS),Cold Plasma spray(CPS) and bonding. the typical targets have Chromium target,Titanium target,Tin target,Zinc target,Silicon target,Silicon-aluminium target,Nickel-chromium target,Zinc-aluminium target,Titanium oxide target.

  If you are looking for sputtering targets to improve your physical vapor deposition(PVD) coating process for low-E glass,anti-reflective glass or solar control glass,please contact us, Baoji Oukai is your best partner.


 
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