Material: Al Si
Standard: High Purity, Above 99.9%
Technics: Hot Isostatic Pressing, Powder metallurgy
Certification: ISO9001, SGS, CTI, ROHS
Thin films of SiO2 and Si3N4 are sputtered from Si(Al) targets. The successful production of Si(Al) targets by thermal spray takes advantage of key spray process features. Its inherent flexibility for target geometry allows a wide range of target diameter, length, and straight or dog-bone target ends, while maximizing target sputter capacity by increasing the target layer thickness up to 9 mm. Aluminum dopant levels can range from 0 wt% to 19 wt%, with strict controls over the final chemical composition. By changing from standard 6 mm thick targets to the new 9 mm targets (containing 50% more material), coating cost can be reduced by up to 3%, and uptime can be raised by 5% because of fewer target swaps.