You are here: Home » Products » Sputtering Target for Solar Energy and Photovoltaic-thermal » Pure Ti Titanium target/Titanium sputtering target for optics and solar energy industry

Search for related products

  • Product Name
  • Product Keyword
  • Product Model
  • Product Summary
  • Product Description
  • Multi Field Search
Share to:

Pure Ti Titanium target/Titanium sputtering target for optics and solar energy industry

  • BAOJI OUKAI
  • TI
  • <100μm
  • 99.8%
  • Semiconductor materials
Quantity:

Item name: Pure Ti Titanium target/Titanium sputtering target for optics and solar energy industry

Material: Ti  

Purity:  99.7%

Grain size: <100μm

Technics: Powder Metallurgy

Application: 

a:  galvanizing

b:  electroplating

c:   the vacuum coating decoration and the function coating industuy 

d:  optics and solar energy industry

Titanium sputtering target is a material that is used to create thin films in a technique known as sputter deposition, or thin film deposition. During this process the titanium, which begins as a solid, is broken up by gaseous ions into tiny particles that form a spray and coat another material, which is known as the substrate. Sputter deposition is commonly involved in the creation of semiconductors and computer chips.

Sputter coating method develop many years, and the technics had been perfect for almost coating materials. Baoji Okai can offer full serious sputtering targets( include metal sputtering target, alloy sputtering targets and intermetallics sputtering targets, ceramic sputtering targets) for college, university, scientific research lab and factory.  


 
Copyright © 2009-2016 Baoji Okai Sputtering Targets Technology Co.,Ltd.  Support: BRAIN