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Item: PVD Coating materials Niobium Nb sputtering targets
Material: Niobium
Purity: 99.9%
Grain size: ＜100μm
Technics: Hot Isostatic Pressing
Application: Widely used in coating processing industries
A: LCD ,photoelectric devices field.
B: Electronic and semiconductor field.
C: Decoration and mould field.
Item: PVD Coating materials Niobium Nb sputtering targets
Material: Niobium
Purity: 99.9%
Grain size: ＜100μm
Technics: Hot Isostatic Pressing
Application: Widely used in coating processing industries
A: LCD ,photoelectric devices field.
B: Electronic and semiconductor field.
C: Decoration and mould field.
