You are here: Home » Products » Sputtering Targets for Low-E Glass Coating » New brand metal Tantalum Ta Sputtering target manufacturer from China

Search for related products

  • Product Name
  • Product Keyword
  • Product Model
  • Product Summary
  • Product Description
  • Multi Field Search
Share to:

New brand metal Tantalum Ta Sputtering target manufacturer from China

  • BAOJI OUKAI
  • Ta
  • <100μm
  • 99.95%
  • widely used in coating processing industries
Quantity:

Item: New brand metal Tantalum Ta Sputtering target manufacturer from China

Material: Ta

Purity: 99.9%

Grain size: <100μm

Technics: Hot Isostatic Pressing, Powder metallurgy

Application: :widely used in coating processing industries
a: architectural glass, car using glass, graphic display field.
b:electronic and semiconductor field.
c:decoration and mould field. 
d:optics coating materials 

Advantage:
High Hard texture
Low impurity content
Better heat dissipation
High Tensile strength 

Tantalum target is a very important material in thin film technology. We can make tantalum target with purity being above 99.95%, small grain size, and good consistent state of recrystal microstructure and three axial positions. In this way, the oxidation film sputtered from cathodic tantalum sputtering target is even and resistant to other chemicals. 

Tantalum sputtering target has been widely used in fiber optics, semiconductor chip, integrated circuit and military areas. Tantalum-projectile has been in development successfully.

 
Copyright © 2009-2016 Baoji Okai Sputtering Targets Technology Co.,Ltd.  Support: BRAIN