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Item: New brand metal Tantalum Ta Sputtering target manufacturer from China
Material: Ta
Purity: 99.9%
Grain size: ＜100μm
Technics: Hot Isostatic Pressing, Powder metallurgy
Application: :widely used in coating processing industries
a: architectural glass, car using glass, graphic display field.
b:electronic and semiconductor field.
c:decoration and mould field.
d:optics coating materials
Advantage:
High Hard texture
Low impurity content
Better heat dissipation
High Tensile strength
Tantalum target is a very important material in thin film technology. We can make tantalum target with purity being above 99.95%, small grain size, and good consistent state of recrystal microstructure and three axial positions. In this way, the oxidation film sputtered from cathodic tantalum sputtering target is even and resistant to other chemicals.
Tantalum sputtering target has been widely used in fiber optics, semiconductor chip, integrated circuit and military areas. Tantalum-projectile has been in development successfully.
