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Molybdenum Niobium alloy target MoNb alloy target sputtering target

  • BAOJI OUKAI
  • Mo Nb
  • <100μm
  • 99.5%-99.99%
  • Semiconductor materials
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Item name: Molybdenum Niobium alloy target  MoNb alloy target  sputtering target

Material: Ti  

Purity:   99.5%-99.99%

Grain size: <100μm

Technics: Powder Metallurgy

Application: Semiconductor materials, vacuum coating, sintering trays and boats, special chemical applications,PVD, CVD.

 
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