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Molybdenum-Copper sputtering target for PVD coating

Views:6     Author:Site Editor     Publish Time: 2017-07-21      Origin:Site

Molybdenum-Copper sputtering target for PVD coating

  Advanced sputtering target for PVD coatings already play an important role in automotive applications for reducing the friction losses and, as a consequence, increasing the fuel efficiency. Nano-composite coatings based on hard metal nitrides surrounded by a soft (not nitride-forming) metal, exhibit high hardness, low friction and high wear resistance.

  For reasons of coating process stability, MoCu sputtering targets with a high volume fraction of molybdenum are best suited to deposit such coatings. During the reactive PVD process the molybdenum will form its nitride while copper is inert in nitrogen atmosphere and therefore will deposit as a metal. For arc ion plating, specially designed MoCu cathodes are available on request.


 
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