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Metal sputtering targets-----Aluminum Al sputtering target

  • Al
  • <100μm
  • 99.6%
  • Widely used in coating processing industries

Item: Metal sputtering targets-----Aluminum Al sputtering target

Purity: 99.6%

Grain Size:<100μm

Technics: Vacuum Melting, Patented thermo-mechanical process

Application: Widely used in coating processing industries:

A: Solar Photovoltaic Application.

B: Electronic and Semiconductor Application.

C: Decoration and Coating Application. etc.

D: Large Area Glass Coating: glass coating material & technology, 

Aluminum metal sputtering target, belongs to sputtering targets.There are two kinds of shape, square and circular.Square target's length is below 1500mm,width is below 400mm and the thickness is above 0.3mm.Circular target's diameter is below 400mm,thickness is limitless. Widely used in vacuum coating industry, target materials raw materials, aerospace industry, Marine automobile industry, electrical industry, instruments industry, etc.

Aluminum is a silvery white reactive metal which is usually covered by a tenacious oxide coating. This renders it inert to acids, but it is attacked by alkalies. It is the most common metallic element in the earth's crust (82000 ppm) and is extracted from the hydrated oxide, Bauxite, by electrolysis of the oxide dissolved in molten sodium hexafluoroaluminate (cryolite). The metal has good thermal properties and is malleable and ductile. Aluminum and its alloys are widely used for various applications including aircraft assemblies and engine parts.

Aluminum (Al) Sputtering Target can also be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Baoji Oukai specializes in producing high purity Aluminum (Al) Sputtering Target with the highest possible density and the lowest prices.


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