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Item: Metal sputtering target-----Ta tantalum sputtering target
Material: Ta
Purity: 99.99%
Grain size: ＜100μm
Technics: Hot Isostatic Pressing, Powder metallurgy
Tantalum targets, also known as tantalum planar sputtering targets, provide consistent and reproducible process performance with high thickness uniformity. The elimination of texture banding during fabrication produces a uniform micro structure, which delivers improved early-life stability and consistent-through-life sputter performance.
For tantalum target, sputtering target supplier-----Baoji Oukai focus on to offer our customers with high purities ranging from 3N to 5N, fine and uniform grain size, elimination of strong texture banding, and early target life size stability.
Item: Metal sputtering target-----Ta tantalum sputtering target
Material: Ta
Purity: 99.99%
Grain size: ＜100μm
Technics: Hot Isostatic Pressing, Powder metallurgy
Tantalum targets, also known as tantalum planar sputtering targets, provide consistent and reproducible process performance with high thickness uniformity. The elimination of texture banding during fabrication produces a uniform micro structure, which delivers improved early-life stability and consistent-through-life sputter performance.
For tantalum target, sputtering target supplier-----Baoji Oukai focus on to offer our customers with high purities ranging from 3N to 5N, fine and uniform grain size, elimination of strong texture banding, and early target life size stability.
