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Item Name | Metal alloy target Titanium Aluminium alloy sputtering target |
Grain size | <100μm |
Material | Ti Al |
Technics | Hot Isostatic Pressing |
Application | Widely used in coating processing industries A: LCD ,photoelectric devices field. B: Electronic and semiconductor field. C: Decoration and mould field. |
Item Name | Metal alloy target Titanium Aluminium alloy sputtering target |
Grain size | <100μm |
Material | Ti Al |
Technics | Hot Isostatic Pressing |
Application | Widely used in coating processing industries A: LCD ,photoelectric devices field. B: Electronic and semiconductor field. C: Decoration and mould field. |
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