You are here: Home » Products » Sputtering Targets for Low-E Glass Coating » Metal Ta tantalum sputtering target for magnetron sputtering machine

Search for related products

Share to:

Metal Ta tantalum sputtering target for magnetron sputtering machine

  • BAOJI OUKAI
  • Ta
  • <100μm
  • 99.95%
  • magnetron sputtering machine
Quantity:

Item: Metal Ta tantalum sputtering target for magnetron sputtering machine

Material: Ta

Purity: 99.95%

Grain size: <100μm

Technics: Hot Isostatic Pressing, Powder metallurgy

Application: Thin film coating,magnetron sputtering machine

Tantalum target is a very important material in thin film technology. We can make tantalum target with purity being above 99.95%, small grain size, and good consistent state of recrystal microstructure and three axial positions. In this way, the oxidation film sputtered from cathodic tantalum sputtering target is even and resistant to other chemicals. 

Tantalum sputtering target has been widely used in fiber optics, semiconductor chip, integrated circuit and military areas. Tantalum-projectile has been in development successfully.

 
Copyright © 2009-2016 Baoji Okai Sputtering Targets Technology Co.,Ltd.  Support: BRAIN