Item: Metal Ta tantalum sputtering target for magnetron sputtering machine
Grain size: ＜100μm
Technics: Hot Isostatic Pressing, Powder metallurgy
Application: Thin film coating,magnetron sputtering machine
Tantalum target is a very important material in thin film technology. We can make tantalum target with purity being above 99.95%, small grain size, and good consistent state of recrystal microstructure and three axial positions. In this way, the oxidation film sputtered from cathodic tantalum sputtering target is even and resistant to other chemicals.
Tantalum sputtering target has been widely used in fiber optics, semiconductor chip, integrated circuit and military areas. Tantalum-projectile has been in development successfully.