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Metal Sputtering Target Chromium Plate Target

  • Chromium (Cr)
  • <100μm
  • 99.9%
  • widely used in coating processing industries

Item Name:  Metal  Sputtering Target Chromium Plate Target

Purity: 99.9% 

Material: Chromium (Cr)

Grain size: <100μm

Technics: Hot Isostatic Pressing(HIP)

Application: Widely used in coating processing industries

a: Architectural glass, car using glass, graphic display field.

b: Electronic and semiconductor field.

c: Decoration and mould field. 

d: Optics coating materials,flat panel display,thin-film solar

Products made of chromium are used in various technologies for the physical deposition of thin films and functional coatings (the PVD method) in the production of electronic components, displays and tools; in the vacuum chroming of watches, parts of household appliances, the working surfaces of hydro-pneumcylinders, slide valves, piston rods, tinted glass, mirrors, car parts and accessories, and other machines and devices. 

When depositing strengthening coatings from ionized plasma using the method of vacuum-arc vaporization of a cathode or by magnetic target sputtering, chromium is used as an adhesive substratum and, in combination with other materials, is used for multi-layer and nanostructural multi-functional wear-resistant coatings. High-quality large-size planar targets made of electrolytic refined chromium (ERC) are used by leading manufacturers of plasma and liquid-crystal displays to deposit metallic conductors during the formation in monitor matrices of thin-film transistors (TFT technology).


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