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Item: Manufacture Tungsten rotary sputtering target with competitive price
Material: Tungsten
Purity: 99.95%
Grain size: <100μm
Technics: Powder metallurgy
Application: Semiconductor, PVD, CVD.
Item: Manufacture Tungsten rotary sputtering target with competitive price
Material: Tungsten
Purity: 99.95%
Grain size: <100μm
Technics: Powder metallurgy
Application: Semiconductor, PVD, CVD.