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Magnetron sputtering target Aluminium Silicon Copper alloy Al-Si-Cu sputtering target

  • BAOJI OUKAI
  • Al Si Cu
  • <100μm
  • Widely used in coating processing industries
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Item: Magnetron sputtering target   Aluminium Silicon Copper alloy Al-Si-Cu sputtering target

Material: Al Si Cu 

Grain size: <100μm

Technics: Powder metallurgy

Applications: Widely used in coating processing industries such as optics, photonics, electronics, solar cells, decoration and other kind.

 


 
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