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Item: Low price tantalum planar sputtering target for vacuum coating
Material: Ta
Purity: 99.96%
Grain size: ＜100μm
Technics: Hot Isostatic Pressing, Powder metallurgy
Application: mainly used as coating, sputtering material
Item: Low price tantalum planar sputtering target for vacuum coating
Material: Ta
Purity: 99.96%
Grain size: ＜100μm
Technics: Hot Isostatic Pressing, Powder metallurgy
Application: mainly used as coating, sputtering material
