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Latest 99.995% Titanium sputtering target for vacuum coating

  • BAOJI OUKAI
  • TI
  • <100μm
  • 99.995%
  • Semiconductor materials
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Item name: Latest 99.995% Titanium sputtering target for vacuum coating

Material: Ti  

Purity:  99.995%

Grain size: <100μm

Technics: Powder Metallurgy

Application: Semiconductor materials, vacuum coating, sintering trays and boats, special chemical applications,PVD, CVD.

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