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High quality Ti sputtering target for PVD
High quality Ti sputtering target for PVD
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High quality Ti sputtering target for PVD

  • OUKAI
  • Ti
  • <100μm
  • 99.99%
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Item:High quality Ti sputtering targets for PVD

Material: Ti

Purity: 99.99%

Grain Size: <100μm

Application: Vacuum coating, gold plating/silver plating/copper plating/nickle plating


 
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