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High quality Ag sputtering target for PVD process

High quality Ag sputtering target for PVD process

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High quality Ag sputtering target for PVD process

Brand: OUKAI
Material: Ag
Grain size: <100μm
Purity: 99.99%

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Product Description

Item:High quality Ag alloy sputtering target for PVD process

Material:Ag

Purity:99.99%

Grain Size: <100μm

Application:Solar Photovoltaic,.Electronic and Semiconductor ,Decoration and Coating.etc.

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