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High quality Ag sputtering target for PVD process
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High quality Ag sputtering target for PVD process

  • OUKAI
  • Ag
  • <100μm
  • 99.99%
Quantity:
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Item:High quality Ag alloy sputtering target for PVD process

Material:Ag

Purity:99.99%

Grain Size: <100μm

Application:Solar Photovoltaic,.Electronic and Semiconductor ,Decoration and Coating.etc.


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