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High purity tubular chromium sputtering target
High purity tubular chromium sputtering target
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High purity tubular chromium sputtering target

  • OUKAI
  • Cr
  • <100μm
  • 99.95%
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Item: High Purity tubular chromium sputtering target

Material: Cr

Purity: 99.95%

Grain Size:<100μm

Application:

1:decoration and mould field.

2:electronic and semiconductor field.

3:optics coating materials


 
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