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Item: High purity silicon carbide target SiC sputtering target for coating
Material: SiC
purity: 99.9%
Grain size:＜100μm
Technics: Powder metallurgy, Vacutln Sintering/HIP
Application: Widely used in coating processing industries
a: architectural glass, car using glass, graphic display field.
b: electronic and semiconductor field.
c: decoration and mould field.
d: optics coating materials
Item: High purity silicon carbide target SiC sputtering target for coating
Material: SiC
purity: 99.9%
Grain size:＜100μm
Technics: Powder metallurgy, Vacutln Sintering/HIP
Application: Widely used in coating processing industries
a: architectural glass, car using glass, graphic display field.
b: electronic and semiconductor field.
c: decoration and mould field.
d: optics coating materials
