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High purity silicon carbide target SiC sputtering target for coating

  • BAOJI OUKAI
  • SiC
  • <100μm
  • 99.9%
  • Widely used in coating processing industries
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Item: High purity silicon carbide target  SiC sputtering target for coating

Material: SiC

purity: 99.9%

Grain size:<100μm

Technics: Powder metallurgy, Vacutln Sintering/HIP

Application: Widely used  in coating processing industries

a: architectural glass, car using glass, graphic display field.

b: electronic and semiconductor field.

c: decoration and mould field.  

d: optics coating materials  


 
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