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High purity coating materials 99.99% Tantalum planar sputtering target

  • OUKAI
  • Ta
  • <100μm
  • 99.99%
  • Widely used in coating processing industries
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Item:High purity coating materials 99.99% Tantalum planar sputtering target

Material: Ta

Purity :99.99%

Grain Size:<100μm

Technics: Hot Isostatic Pressing (HIP)

Application:Widely used in coating processing industries

A: Magnetic Data Storage Application

B: Electronic and Semiconductor Application.

C: Decoration and Coating Application. etc.


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