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| Quantity: | |
|---|---|
Item:High purity coating materials 99.99% Tantalum planar sputtering target
Material: Ta
Purity :99.99%
Grain Size:<100μm
Technics: Hot Isostatic Pressing (HIP)
Application:Widely used in coating processing industries
A: Magnetic Data Storage Application
B: Electronic and Semiconductor Application.
C: Decoration and Coating Application. etc.
Item:High purity coating materials 99.99% Tantalum planar sputtering target
Material: Ta
Purity :99.99%
Grain Size:<100μm
Technics: Hot Isostatic Pressing (HIP)
Application:Widely used in coating processing industries
A: Magnetic Data Storage Application
B: Electronic and Semiconductor Application.
C: Decoration and Coating Application. etc.
