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High purity chromium Cr sputtering target (annular target)
High purity chromium Cr sputtering target (annular target)
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High purity chromium Cr sputtering target (annular target)

  • OUKAI
  • Cr
  • <100μm
  • 99.995%
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Item:High purity chromium Cr sputtering target (annular target)

Material: Cr

Purity: 99.995%

Grain Size: <100μm

Application:Widely used in coating processing industries

a: architectural glass, car using glass, graphic display field.

b:electronic and semiconductor field.


 
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