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| Quantity: | |
|---|---|
Item:High purity chromium Cr sputtering target (annular target)
Material: Cr
Purity: 99.995%
Grain Size: <100μm
Application:Widely used in coating processing industries
a: architectural glass, car using glass, graphic display field.
b:electronic and semiconductor field.
Item:High purity chromium Cr sputtering target (annular target)
Material: Cr
Purity: 99.995%
Grain Size: <100μm
Application:Widely used in coating processing industries
a: architectural glass, car using glass, graphic display field.
b:electronic and semiconductor field.
