High purity Zirconium Zr sputtering target for thin film coating
HIP, Vacuum melting or Press-sintered
widely used in coating processing industries
a: architectural glass, car using glass, graphic display field.
b:electronic and semiconductor field.
c:decoration and mould field.
d:optics coating materials
Zirconium (Zr) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. China sputtering target manufacturer----Baoji Oukai specializes in producing high purity Zirconium (Zr) Sputtering Target with the highest possible density and the lowest prices.