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High purity Zirconium Zr sputtering target for thin film coating

  • BAOJI OUKAI
  • Zr Zirconium
  • <100μm
  • 3N5
  • widely used in coating processing industries
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Item Name

High purity Zirconium Zr sputtering target for thin film coating

Purity

3N5

Shape

Round

Material

Zr Zirconium

Technics

HIP, Vacuum melting or Press-sintered

Application

widely used in coating processing industries

a: architectural glass, car using glass, graphic display field.

b:electronic and semiconductor field.

c:decoration and mould field.  

d:optics coating materials  

Zirconium (Zr) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. China sputtering target manufacturer----Baoji Oukai specializes in producing high purity Zirconium (Zr) Sputtering Target with the highest possible density and the lowest prices.

 
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