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High purity Tungsten sputtering target for thin film materials

  • BAOJI OUKAI
  • Tungsten
  • ＜100μm
  • 99.95%
  • Semiconductor, PVD, CVD.
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Item:  High purity Tungsten sputtering target for thin film materials

Material: Tungsten 

Purity: 99.95%

Grain size: ＜100μm 

Technics: Powder metallurgy

Application: Semiconductor, PVD, CVD.

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