You are here: Home » Products » Sputtering Targets for Decoration and Tool Coating » High purity Ti-Al alloy sputtering target

Search for related products

Share to:

High purity Ti-Al alloy sputtering target

  • OUKAI
  • Ti、Al
  • <100μm
  • 99.5%-99.8%
Quantity:

Item:High purity Ti-Al alloy sputtering target

Material: Ti、Al

Purity: 99.5%-99.8%

Grain Size: <100μm

Application:mainly applied to electron,chemical industry horologe,glasses,ornaments,sports good mechanical equipments,galvanizing apparatus,golf,precision processing industry and so on.


Related articles

content is empty!

 
Copyright © 2009-2016 Baoji Okai Sputtering Targets Technology Co.,Ltd.  Support: BRAIN