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High purity Ti-Al alloy sputtering target

  • OUKAI
  • Ti、Al
  • <100μm
  • 99.5%-99.8%
Quantity:

Item:High purity Ti-Al alloy sputtering target

Material: Ti、Al

Purity: 99.5%-99.8%

Grain Size: <100μm

Application:mainly applied to electron,chemical industry horologe,glasses,ornaments,sports good mechanical equipments,galvanizing apparatus,golf,precision processing industry and so on.


 
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