High purity 99.95% Cr sputtering target use in PVD

Item:High purity 99.95% Cr sputtering target use in PVD

Material:Cr

Purity: 3N4N

Grain Size:<100μm

Application:

1. For producing electric light source parts and electric vacuum components.

2. For producing heating elements and refractory parts in high temperature furnaces.

3. For producing medical laboratory equipment.