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High purity 99.95% Cr sputtering target use in PVD
High purity 99.95% Cr sputtering target use in PVD
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High purity 99.95% Cr sputtering target use in PVD

  • OUKAI
  • Cr
  • <100μm
  • 99.95%
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Item:High purity 99.95% Cr sputtering target use in PVD

Material:Cr

Purity: 3N4N

Grain Size:<100μm

Application:

1. For producing electric light source parts and electric vacuum components.

2. For producing heating elements and refractory parts in high temperature furnaces.

3. For producing medical laboratory equipment.


 
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