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Item:High purity 99.95% Cr sputtering target use in PVD
Material:Cr
Purity: 3N4N
Grain Size:<100μm
Application:
1. For producing electric light source parts and electric vacuum components.
2. For producing heating elements and refractory parts in high temperature furnaces.
3. For producing medical laboratory equipment.
Item:High purity 99.95% Cr sputtering target use in PVD
Material:Cr
Purity: 3N4N
Grain Size:<100μm
Application:
1. For producing electric light source parts and electric vacuum components.
2. For producing heating elements and refractory parts in high temperature furnaces.
3. For producing medical laboratory equipment.
