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High density 99.95% Mo molybdenum sputtering target

  • OUKAI
  • Mo
  • <100μm
  • 99.95%
Quantity:

Item:High density 99.95% Mo molybdenum sputtering target

Material: Mo

Purity: 99.95%

Grain Size: <100μm

Application:Widely used in coating processing industries

A: Solar Photovoltaic Application.

B: Electronic and Semiconductor Application.


 
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