Item: Factory supply Mo-Nb alloy sputtering target
Grain size: ＜100μm
1. For producing electric light source parts and electric vacuum components.
2. For producing heating elements and refractory parts in high temperature furnaces.
3. For producing medical laboratory equipment.
4. Used as electrodes in the field of rare earth industry.
5. Used in the manufacture of weapons.
6. Used to make decorations and etc.