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Item: Factory price high purity Alumina Doped Zinc Oxide AZO target
Material: ZnO Al2O3
Grain Size: <100μm
Technics: Hot Isostatic Pressing, Vacuum Sintering/HIP
Application: Semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display and optical coating material.
AZO (Al2O3-ZnO) target is able to form TCO (Transparent Conductive Oxide) film which is a transparent film with high conductivity.
AZO has been drawing more attention lately as an alternative to ITO (In2O3-SnO2) while ITO is much more expensive and grows more concerns about its bad influence on human bodies.
AZO Sputtering Target (Alumina Doped Zinc Oxide) is a transparent conductive oxide commonly used as a transparent electrode for solar photovoltaic applications and in large area architectural glass coating.
Item: Factory price high purity Alumina Doped Zinc Oxide AZO target
Material: ZnO Al2O3
Grain Size: <100μm
Technics: Hot Isostatic Pressing, Vacuum Sintering/HIP
Application: Semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display and optical coating material.
AZO (Al2O3-ZnO) target is able to form TCO (Transparent Conductive Oxide) film which is a transparent film with high conductivity.
AZO has been drawing more attention lately as an alternative to ITO (In2O3-SnO2) while ITO is much more expensive and grows more concerns about its bad influence on human bodies.
AZO Sputtering Target (Alumina Doped Zinc Oxide) is a transparent conductive oxide commonly used as a transparent electrode for solar photovoltaic applications and in large area architectural glass coating.
