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Item: China manufacturer supply Ta Tantalum sputtering target for vacuum coating
Material: Ta
Purity: 99.5%
Grain size: <100μm
Technics: Hot Isostatic Pressing, Powder metallurgy
Application: Thin film coating
Item: China manufacturer supply Ta Tantalum sputtering target for vacuum coating
Material: Ta
Purity: 99.5%
Grain size: <100μm
Technics: Hot Isostatic Pressing, Powder metallurgy
Application: Thin film coating
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