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| Quantity: | |
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Item: Aluminium Al sputtering target for vacuum coating film
Material: Al
Purity: 99.99%(4N)
Grain Size:<100μm
Technics: Vacuum Melting, Patented thermo-mechanical process
Application: Widely used in coating processing industries:
A: Solar Photovoltaic Application.
B: Electronic and Semiconductor Application.
C: Decoration and Coating Application. etc.
Item: Aluminium Al sputtering target for vacuum coating film
Material: Al
Purity: 99.99%(4N)
Grain Size:<100μm
Technics: Vacuum Melting, Patented thermo-mechanical process
Application: Widely used in coating processing industries:
A: Solar Photovoltaic Application.
B: Electronic and Semiconductor Application.
C: Decoration and Coating Application. etc.
